Download or read book Ion Beam Deposition of Multilayer Metallic Thin Films written by Jaeshin Ahn and published by . This book was released on 1979 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: An innovative thin film deposition technique : low energy ion beam deposition, is further studied. The theoretical deposition processes of this method are discussed. Double layer thin films of Mg and Pb on carbon substrates are produced by this method and compared with similar films grown by thermal evaporation. Their characteristics are investigated by Rutherford backscattering analysis and Scanning Electron Microscopy, The RBS technique is expanded to derive a profile of composition ratio versus depth within the deposits and applied to a depth analysis of the double layer films. The present study of film characteristics shows that a high level of mass selectivity is observed from the low energy ion beam deposited Mg films. The oxidation of Mg films is not limited to the film surface : oxygen is seen to be distributed into the Mg region rather than staying on the surface. The preferential migration of Pb into Mg is observed and the diffusion coefficient of Pb into Mg at 300° C is calculated as 1.236 x 10[superscript -14] cm[superscript 2]/sec. The interdiffusion region between the Mg and Pb film layer ranges from 1000 to 3000 Å at room temperature.