Advanced Short-time Thermal Processing for Si-based CMOS Devices 2

Advanced Short-time Thermal Processing for Si-based CMOS Devices 2
Author :
Publisher : The Electrochemical Society
Total Pages : 444
Release :
ISBN-10 : 1566774063
ISBN-13 : 9781566774062
Rating : 4/5 (63 Downloads)

Book Synopsis Advanced Short-time Thermal Processing for Si-based CMOS Devices 2 by : Mehmet C. Öztürk

Download or read book Advanced Short-time Thermal Processing for Si-based CMOS Devices 2 written by Mehmet C. Öztürk and published by The Electrochemical Society. This book was released on 2004 with total page 444 pages. Available in PDF, EPUB and Kindle. Book excerpt:


Advanced Short-time Thermal Processing for Si-based CMOS Devices 2 Related Books

Advanced Short-time Thermal Processing for Si-based CMOS Devices 2
Language: en
Pages: 444
Authors: Mehmet C. Öztürk
Categories: Technology & Engineering
Type: BOOK - Published: 2004 - Publisher: The Electrochemical Society

DOWNLOAD EBOOK

Advanced Short-time Thermal Processing for Si-based CMOS Devices
Language: en
Pages: 488
Authors: Fred Roozeboom
Categories: Computers
Type: BOOK - Published: 2003 - Publisher: The Electrochemical Society

DOWNLOAD EBOOK

Advanced Gate Stack, Source/drain, and Channel Engineering for Si-based CMOS 2
Language: en
Pages: 472
Authors: Fred Roozeboom
Categories: Gate array circuits
Type: BOOK - Published: 2006 - Publisher: The Electrochemical Society

DOWNLOAD EBOOK

These proceedings describe processing, materials, and equipment for CMOS front-end integration including gate stack, source/drain and channel engineering. Topic
Advanced Gate Stack, Source/drain and Channel Engineering for Si-based CMOS
Language: en
Pages: 658
Authors:
Categories: Technology & Engineering
Type: BOOK - Published: 2005 - Publisher:

DOWNLOAD EBOOK

Physics and Technology of High-k Gate Dielectrics II
Language: en
Pages: 512
Authors: Samares Kar
Categories: Science
Type: BOOK - Published: 2004 - Publisher: The Electrochemical Society

DOWNLOAD EBOOK

"This volume is the proceedings of The Second International Symposium on High Dielectric Constant Materials: Materials Science, Processing, Reliability, and Man