Download or read book Ultrathin SiO2 and High-K Materials for ULSI Gate Dielectrics: Volume 567 written by H. R. Huff and published by . This book was released on 1999-09 with total page 650 pages. Available in PDF, EPUB and Kindle. Book excerpt: Device scaling has been the engine driving the continued pervasiveness of the microelectronics revolution. The SIA roadmap calls for 4-5nm films (oxide equivalent thickness) in 2000, and