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Process for Fabricating High Reflectance-low Stress Mo--Si Multilayer Reflective Coatings
Language: en
Pages:
Authors:
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Type: BOOK - Published: 2001 - Publisher:

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A high reflectance-low stress Mo--Si multilayer reflective coating particularly useful for the extreme ultraviolet (EUV) wavelength region. While the multilayer
High Reflectance-low Stress Mo-Si Multilayer Reflective Coatings
Language: en
Pages:
Authors:
Categories:
Type: BOOK - Published: 2000 - Publisher:

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A high reflectance-low stress Mo-Si multilayer reflective coating particularly useful for the extreme ultraviolet (EUV) wavelength region. While the multilayer
EUV Lithography
Language: en
Pages: 704
Authors: Vivek Bakshi
Categories: Art
Type: BOOK - Published: 2009 - Publisher: SPIE Press

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Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This b
Official Gazette of the United States Patent and Trademark Office
Language: en
Pages: 1226
Authors: United States. Patent and Trademark Office
Categories: Patents
Type: BOOK - Published: 2001 - Publisher:

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Advances in the Reduction and Compensation of Film Stress in High-reflectance Multilayer Coatings for Extreme Ultraviolet Lithography Applications
Language: en
Pages: 19
Authors:
Categories:
Type: BOOK - Published: 1998 - Publisher:

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Due to the stringent surface figure requirements for the multilayer-coated optics in an extreme ultraviolet (EUV) projection lithography system, it is desirable